On the Relationship between Nonstoichiometry and Passivity Breakdown in Ultrathin Oxides: Combined Depth-Dependent Spectroscopy, Mott−Schottky Analysis, and Molecular Dynamics Simulation Studies-Reference-Cited by-同舟云学术

On the Relationship between Nonstoichiometry and Passivity Breakdown in Ultrathin Oxides: Combined Depth-Dependent Spectroscopy, Mott−Schottky Analysis, and Molecular Dynamics Simulation Studies

Published:2009-02-06 Issue:9 Volume:113 Page:3502-3511
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Chang Chia-Lin¹,Sankaranarayanan Subramanian K. R. S.¹,Engelhard Mark H.¹,Shutthanandan V.¹,Ramanathan Shriram¹

Affiliation:

1. Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, and W.R. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp808424g

Reference93 articles.

1. Effect of native Al2O3 on the elastic response of nanoscale Al films

2. Nanoscale Void Nucleation and Growth in the Passive Oxide on Aluminum as a Prepitting Process

3. A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation

4. The Point Defect Model for the Passive State

5. The protectivity of aluminum and its alloys with transition metals

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