Atomic Layer Deposition of Lanthanum Stabilized Amorphous Hafnium Oxide Thin Films
Author:
Affiliation:
1. Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm9001064
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4. Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
5. Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2]
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