Photoinduced Disorder in Strongly Segregated Block Copolymer Composite Films for Hierarchical Pattern Formation-Reference-Cited by-同舟云学术

Photoinduced Disorder in Strongly Segregated Block Copolymer Composite Films for Hierarchical Pattern Formation

Published:2013-01-18 Issue:2 Volume:7 Page:1513-1523
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Yao Li¹,Watkins James J.¹

Affiliation:

1. Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn3052956

Reference71 articles.

1. Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds

2. Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates

3. Nanotechnology with Soft Materials

4. Block Copolymers as a Tool for Nanomaterial Fabrication

5. Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes

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