Time-Resolved in Situ Raman and Small-Angle X-ray Diffraction Experiments: From Silica-Precursor Hydrolysis to Development of Mesoscopic Order in SBA-3 Surfactant-Templated Silica

Author:

Baccile Niki1,Teixeira Cilaine V.1,Amenitsch Heinz1,Villain Françoise1,Lindén Mika1,Babonneau Florence1

Affiliation:

1. Laboratoire de Chimie de la Matière Condensée de Paris (LCMCP), Université Pierre et Marie Curie-Paris 6 and CNRS, 4 place Jussieu, Paris, France, Department of Physical Chemistry, Åbo Akademi University, Turku, Finland, Institute of Biophysics and Nanosystems Research, Austrian Academy of Sciences, Graz, Austria, and Chimie Inorganique et Matériaux Moléculaires (CIM2), Université Pierre et Marie Curie-Paris 6 and CNRS, 4 place Jussieu, Paris, France

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The Chemical-Physical Processes Behind Self-assembly;Advances in Sol-Gel Derived Materials and Technologies;2021-12-17

2. In situ scattering studies of material formation during wet-chemical syntheses;Reference Module in Chemistry, Molecular Sciences and Chemical Engineering;2021

3. Formation of block-copolymer-templated mesoporous silica;Journal of Colloid and Interface Science;2018-07

4. Influence of surfactants of different nature and chain length on the morphology, thermal stability and sheet resistance of graphene;Soft Matter;2018

5. Nanostuctured mesoporous materials from different silica sources using fluorinated surfactants as templates;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2016-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3