Non-lift-off Block Copolymer Lithography of 25 nm Magnetic Nanodot Arrays
Author:
Affiliation:
1. Department of Chemical Engineering and Materials Science, ‡Department of Chemistry, and §Department of Physics, University of Minnesota, Minneapolis, Minnesota 55455, United States
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am200693x
Reference48 articles.
1. Ordering in thin films of block copolymers: Fundamentals to potential applications
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5. Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing
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