Chemisorption and Reaction Characteristics of Methyl Radicals on Cu(110)-Reference-Cited by-同舟云学术

Chemisorption and Reaction Characteristics of Methyl Radicals on Cu(110)

Published:2004-04-01 Issue:9 Volume:20 Page:3623-3631
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Zhai Run-Sheng¹,Chan Yuet Loy¹,Chuang Ping¹,Hsu Chien-Kui¹,Mukherjee Manabendra¹,Chuang Tung J.¹,Klauser Ruth¹

Affiliation:

1. Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, People's Republic of China, Surface Physics Division, Saha Institute of Nuclear Physics, Calcutta 700064, India, and National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la036294u

Reference47 articles.

1. Mimicking Aspects of Heterogeneous Catalysis: Generating, Isolating, and Reacting Proposed Surface Intermediates on Single Crystals in Vacuum

2. Identification and stability of CH3, CH2, and CH species on Co and Ni surfaces, a Pes investigation

3. Adsorption and decomposition of methyl halides on Ni(100): A TPD, SIMS and AES study

4. Decomposition kinetics of CH3 (CD3) on Ni(100)

5. Perturbations, inhibition, and promotion of ultraviolet surface photochemistry: CH3 Br on Br/Ni(111)

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