Fabrication of Sub-10-nm Silicon Nanowire Arrays by Size Reduction Lithography-Reference-Cited by-同舟云学术

Fabrication of Sub-10-nm Silicon Nanowire Arrays by Size Reduction Lithography

Published:2003-03-20 Issue:15 Volume:107 Page:3340-3343
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Choi Yang-Kyu¹,Zhu Ji¹,Grunes Jeff¹,Bokor Jeffrey¹,Somorjai Gabor. A.¹

Affiliation:

1. Department of Electrical Engineering and Computer Sciences, UC Berkeley, Berkeley, California 94720, Department of Chemistry, UC Berkeley, Berkeley, California 94720, Material Science and Chemistry Division, Lawrence Berkeley National Lab, Berkeley, California 94720

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0222649

Reference12 articles.

1. Nanowire Nanosensors for Highly Sensitive and Selective Detection of Biological and Chemical Species

2. Nanofabrication and diffractive optics for high-resolution x-ray applications

3. Ethylene Hydrogenation over Platinum Nanoparticle Array Model Catalysts Fabricated by Electron Beam Lithography: Determination of Active Metal Surface Area

4. Electron beam lithography: resolution limits and applications

5. "Dip-Pen" Nanolithography

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