FTIR Study of the Oxidation of Porous Silicon
Author:
Affiliation:
1. Surface Science Center, Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp963322r
Reference40 articles.
1. The adsorption of oxygen on silicon (111) surfaces. I
2. The interaction of molecular and atomic oxygen with Si(100) and Si(111)
3. Chemical shifts of SiH stretching frequencies at Si(100) surfaces pre-exposed to oxygen in the submonolayer range
4. In situ internal reflection infrared study of aqueous hydrofluoric acid and ultraviolet/ozone treated silicon (100) surfaces
5. Infrared spectroscopic study of initial stages of ultraviolet ozone oxidation of Si(100) and (111) surfaces
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