Recent Advances in Spin-coating Precursor Mediated Chemical Vapor Deposition of Two-Dimensional Transition Metal Dichalcogenides-Reference-Cited by-同舟云学术

Recent Advances in Spin-coating Precursor Mediated Chemical Vapor Deposition of Two-Dimensional Transition Metal Dichalcogenides

Published:2024-02-13 Issue:7 Volume:2 Page:282-299
ISSN:2771-9316
Container-title:Precision Chemistry
language:en
Short-container-title:Precision Chemistry

Author:

Shen Dingyi¹,Jin Yejun¹,Zhang Zucheng¹,Song Rong¹,Liu Miaomiao¹,Li Wei¹,Li Xin¹,Wu Ruixia¹,Li Bo²^ORCID,Li Jia¹,Zhao Bei³,Duan Xidong¹^ORCID

Affiliation:

1. Hunan Key Laboratory of Two-Dimensional Materials, State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, 410082 Changsha, China

2. School of Physics and Electronics, Hunan University, 410082 Changsha, China

3. Key Laboratory of Quantum Materials and Devices of Ministry of Education, School of Physics, Southeast University, Nanjing 211189, China

Funder

Natural Science Foundation of Jiangsu Province

National Natural Science Foundation of China

Key Research and Development Program of Hunan Province of China

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/prechem.3c00115

Reference100 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Two-dimensional transition metal dichalcogenides as atomically thin semiconductors: opportunities and challenges

3. Electrical Transport Properties of Single-Layer WS2

4. Atomically thin p–n junctions with van der Waals heterointerfaces

5. Logic-in-memory based on an atomically thin semiconductor

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