Characterization of Pore Structure in a Nanoporous Low-Dielectric-Constant Thin Film by Neutron Porosimetry and X-ray Porosimetry-Reference-Cited by-同舟云学术

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Characterization of Pore Structure in a Nanoporous Low-Dielectric-Constant Thin Film by Neutron Porosimetry and X-ray Porosimetry

Published:2004-07-02 Issue:16 Volume:20 Page:6658-6667
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Hedden Ronald C.¹,Lee Hae-Jeong¹,Soles Christopher L.¹,Bauer Barry J.¹

Affiliation:

1. Polymers Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la036334u

Reference25 articles.

1. Low dielectric constant materials for microelectronics

2. Manual of Symbols and Terminology for Physicochemical Quantities and Units, Appendix II: Definitions, Terminology and Symbols in Colloid and Surface Chemistry

3. Application of ion scattering techniques to characterize polymer surfaces and interfaces

4. Small angle neutron scattering at the National Institute of Standards and Technology

5. The NIST Cold Neutron Research Facility

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