Molecular Complexes between Silicon Derivatives and Electron-Rich Groups
Author:
Affiliation:
1. Instituto de Química Médica (CSIC), Juan de la Cierva 3, 28006-Madrid, Spain
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp002808b
Reference29 articles.
1. Rotational spectra, dipole moment, and structure of the SiF4–NH3 dimer
2. Free-jet IR spectroscopy of SiF4N2 and SiF4CO complexes in the 10 μm region
3. Modelling nucleophilic substitution at silicon in solution, using hypervalent silicon compounds based on 2-pyridones
4. Modelling nucleophilic substitution at silicon in solution using hypervalent silicon compounds based on 2-thiopyridones
5. A New Class of Silatranes: Structure and Dynamic NMR Behavior1
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