New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm-Reference-Cited by-同舟云学术

New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm

Published:2006-03-28 Issue:9 Volume:39 Page:3252-3261
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Feiring Andrew E.¹,Crawford Michael K.¹,Farnham William B.¹,Feldman Jerald¹,French Roger H.¹,Junk Christopher P.¹,Leffew Kenneth W.¹,Petrov Viacheslav A.¹,Qiu Weiming¹,Schadt Frank L.¹,Tran Hoang V.¹,Zumsteg Fredrick C.¹

Affiliation:

1. DuPont Central Research & Development, Experimental Station, P.O. Box 80328, Wilmington, Delaware 19880-0328

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma060070b

Reference42 articles.

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