Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing-Reference-Cited by-同舟云学术

Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing

Published:2010-06-07 Issue:6 Volume:2 Page:1743-1753
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Pulsipher Daniel J. V.¹,Martin Ina T.¹,Fisher Ellen R.¹

Affiliation:

1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872, and National Center for Photovoltaics, National Renewable Energy Laboratory, Golden, Colorado 80401

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am100233j

Reference78 articles.

1. High resolution transmission electron microscopy and three-dimensional atom probe microscopy as complementary techniques for the high spatial resolution analysis of GaN based quantum well systems

2. Photocatalytic activity of NOx-doped TiO2 in the visible light region

3. Visible-Light Photocatalysis in Nitrogen-Doped Titanium Oxides

4. High-Efficiency Dye-Sensitized Solar Cell Based on a Nitrogen-Doped Nanostructured Titania Electrode

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