Formation of Well-Ordered Step Structures on Si(111) by a Combination of Chemical Etching and Surface Scratching for Producing Macrosized Patterns
Author:
Affiliation:
1. Division of Chemistry, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp036804t
Reference11 articles.
1. Mesoscopic Metal Particles and Wires by Electrodeposition
2. Functionalization of silicon step arrays I: Au passivation of stepped Si(111) templates
3. Step arrangement design and nanostructure self-organization on Si surfaces
4. Atomic step networks as selective epitaxial templates
5. Control of atomic step arrangements on a patterned Si(111) substrate by using molecular beam epitaxy
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