Role of Interstitial Voids in Oxides on Formation and Stabilization of Reactive Radicals: Interstitial HO2 Radicals in F2-Laser-Irradiated Amorphous SiO2-Reference-Cited by-同舟云学术

Role of Interstitial Voids in Oxides on Formation and Stabilization of Reactive Radicals: Interstitial HO2 Radicals in F2-Laser-Irradiated Amorphous SiO2

Published:2006-03-30 Issue:16 Volume:128 Page:5371-5374
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Kajihara Koichi¹,Hirano Masahiro¹,Skuja Linards¹,Hosono Hideo¹

Affiliation:

1. Contribution from the Transparent Electro-Active Materials Project, ERATO-SORST, Japan Science and Technology Agency, Frontier Collaborative Research Center, Mail Box S2-13, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja0571390

Reference51 articles.

1. Ozone Decomposition in Water Studied by Pulse Radiolysis 1. HO2/O2- and HO3/O3- as Intermediates - Correction

2. Ordered mesoporous molecular sieves synthesized by a liquid-crystal template mechanism

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