Growth Model of van der Waals Epitaxy of Films: A Case of AlN Films on Multilayer Graphene/SiC

Author:

Xu Yu123ORCID,Cao Bing,Li Zongyao2,Cai Demin2,Zhang Yumin123,Ren Guoqiang12,Wang Jianfeng12,Shi Lin1,Wang Chinhua,Xu Ke12

Affiliation:

1. Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou 215123, P. R. China

2. Suzhou Nanowin Science and Technology Co., Ltd., Suzhou 215123, P. R. China

3. University of Chinese Academy of Sciences, Beijing 100049, P. R. China

Funder

Ministry of Science and Technology of the People's Republic of China

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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3. Study on Nucleation and Growth Mode of GaN on Patterned Graphene by Epitaxial Lateral Overgrowth;Crystal Growth & Design;2023-06-28

4. Applications of remote epitaxy and van der Waals epitaxy;Nano Convergence;2023-04-30

5. Influence of patterned graphene mask on nucleation behavior of GaN by MOCVD;2022 19th China International Forum on Solid State Lighting & 2022 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-02-07

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