Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns-Reference-Cited by-同舟云学术

Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns

Published:2017-11-14 Issue:47 Volume:9 Page:41607-41617
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Seo Seunggi,Yeo Byung Chul¹,Han Sang Soo¹^ORCID,Yoon Chang Mo,Yang Joon Young²,Yoon Jonggeun²,Yoo Choongkeun²,Kim Ho-jin²,Lee Yong-baek²,Lee Su Jeong,Myoung Jae-Min^ORCID,Lee Han-Bo-Ram³,Kim Woo-Hee⁴,Oh Il-Kwon,Kim Hyungjun^ORCID

Affiliation:

1. Center of Computational Science, Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seoul 02792, Republic of Korea

2. LG Display Co., Ltd., 245, LG-ro, Wollong-myeon, Paju-si, Gyeonggi-do 10845, Republic of Korea

3. Department of Materials Science and Engineering, Incheon National University, 119 Academy-ro, Yeonsu-gu, Incheon 22012, Republic of Korea

4. Division of Advanced Materials Engineering, Chonbuk National University, Jeonbuk 54896, Republic of Korea

Funder

LG Display

National Research Foundation of Korea

Korea Institute of Science and Technology

Yonsei University

Ministry of Science, ICT and Future Planning

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b13365

Reference70 articles.

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4. Introducing Defects in 3D Photonic Crystals: State of the Art

5. Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition

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