Giant Blistering of Nanometer-Thick Al2O3/ZnO Films Grown by Atomic Layer Deposition: Mechanism and Potential Applications-Reference-Cited by-同舟云学术

Giant Blistering of Nanometer-Thick Al2O3/ZnO Films Grown by Atomic Layer Deposition: Mechanism and Potential Applications

Published:2017-07-31 Issue:31 Volume:9 Page:26201-26209
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Liu Hongfei¹^ORCID,Guo Shifeng¹,Yang Ren Bin¹,Lee Coryl J. J.¹,Zhang Lei¹

Affiliation:

1. Institute of Materials Research and Engineering (IMRE), A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, Singapore 138634, Singapore

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b08260

Reference45 articles.

1. In situ study of the initiation of hydrogen bubbles at the aluminium metal/oxide interface

2. Effect of hydrogen on the integrity of aluminium–oxide interface at elevated temperatures

3. Analysis of the accuracy of the bulge test in determining the mechanical properties of thin films

4. Blistering in Cu 2 ZnSnS 4 thin films: correlation with residual stresses

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