Photomanipulated Architecture and Patterning of Azopolymer Array-Reference-Cited by-同舟云学术

Photomanipulated Architecture and Patterning of Azopolymer Array

Published:2017-05-22 Issue:22 Volume:9 Page:19345-19353
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Kong Xueli¹,Wang Xiaofan¹,Luo Tianchan²,Yao Yuan¹,Li Lei²^ORCID,Lin Shaoliang¹^ORCID

Affiliation:

1. Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China

2. College of Materials, Xiamen University, Xiamen 621005, China

Funder

Ministry of Education of the People's Republic of China

National Natural Science Foundation of China

Shanghai Municipality

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b04273

Reference59 articles.

1. Recent progress on surface pattern fabrications based on monolayer colloidal crystal templates and related applications

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3. A Stretchable Form of Single-Crystal Silicon for High-Performance Electronics on Rubber Substrates

4. Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospects

5. Patterning of controllable surface wettability for printing techniques

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