Carbon Nanotubes as Etching Masks for the Formation of Polymer Nanostructures-Reference-Cited by-同舟云学术

Carbon Nanotubes as Etching Masks for the Formation of Polymer Nanostructures

Published:2017-12-08 Issue:50 Volume:9 Page:44053-44059
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Yim Woongbin¹,Park Sae June¹,Han Sung Yong¹,Park Yong Hyun¹,Lee Sang Woon¹^ORCID,Park Hui Joon¹^ORCID,Ahn Yeong Hwan¹^ORCID,Lee Soonil¹,Park Ji-Yong¹^ORCID

Affiliation:

1. Department of Physics and ‡Department of Energy Systems Research, Ajou University, Suwon 16499, Korea

Funder

National Research Foundation of Korea

Korea Institute of Energy Technology Evaluation and Planning

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b18035

Reference50 articles.

1. Trends in sputtering

2. Introduction and overview

3. Tuning of ripple patterns and wetting dynamics of Si (100) surface using ion beam irradiation

4. Engineering of nanostructured carbon materials with electron or ion beams

5. Ion and electron irradiation-induced effects in nanostructured materials

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