Producing Small Domain Features Using Miktoarm Block Copolymers with Large Interaction Parameters-Reference-Cited by-同舟云学术

Producing Small Domain Features Using Miktoarm Block Copolymers with Large Interaction Parameters

Published:2015-11-05 Issue:11 Volume:4 Page:1287-1292
ISSN:2161-1653
Container-title:ACS Macro Letters
language:en
Short-container-title:ACS Macro Lett.

Author:

Shi Weichao¹,Tateishi Yuichi¹,Li Wei¹,Hawker Craig J.¹,Fredrickson Glenn H.¹,Kramer Edward J.¹

Affiliation:

1. Materials Research Laboratory, ‡Department of Chemistry and Biochemistry, §Materials Department, and ⊥Department of Chemical Engineering, University of California, Santa Barbara, California 93106, United States

Funder

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsmacrolett.5b00712

Reference42 articles.

1. Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

2. Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-d,l-lactide) with Sub-10 nm Domains

3. Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films

4. Controlling of 6 nm Sized and 10 nm Pitched Dot Arrays Ordered along Narrow Guide Lines Using PS–PDMS Self-Assembly

5. Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

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