Two-Photon Acid Generation in Thin Polymer Films. Photoinduced Electron Transfer As a Promising Tool for Subwavelength Lithography-Reference-Cited by-同舟云学术

Two-Photon Acid Generation in Thin Polymer Films. Photoinduced Electron Transfer As a Promising Tool for Subwavelength Lithography

Published:2009-12-16 Issue:1 Volume:22 Page:15-17
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Billone Paul S.¹,Park Julie M.¹,Blackwell James M.²,Bristol Robert²,Scaiano J.C.¹

Affiliation:

1. Department of Chemistry, Centre for Catalysis Research and Innovation, University of Ottawa, Ottawa, Canada K1N 6N5

2. Components Research, Intel Corporation, 2511 NW 229th Avenue, Hillsboro, Oregon 97124

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm903313j

Reference23 articles.

1. Double Exposure Materials: Simulation Study of Feasibility

2. Bristol, R.; Shykind, D.; Kim, S.; Borodovsky, Y.; Schwartz, E.; Turner, C.; Masson, G.; Min, K.; Esswein, K.; Blackwell, J. M.; Suetin, N.Advances in Resist Materials and Processing Technology XXVI;1sted.SPIE:San Jose, CA, 2009; Vol.7273, p727307.

3. Photochemistry of organic reaction intermediates: novel reaction paths induced by two-photon laser excitation

4. Non-ionic photo-acid generators for applications in two-photon lithography

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