Conformal Electroless Nickel Plating on Silicon Wafers, Convex and Concave Pyramids, and Ultralong Nanowires
Author:
Affiliation:
1. Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
2. MESA Research Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
Funder
Department of Mechanical Engineering, Stanford University
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.8b06002
Reference52 articles.
1. Evolution of metal plating for silicon solar cell metallisation
2. Protective coatings on magnesium and its alloys — a critical review
3. Deposition Behavior of Ni on Si(100) Surfaces in an Aqueous Alkaline Solution
4. Direct electroless nickel plating on silicon surface
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