Enhanced Transmission and Self-Cleaning of Patterned Sapphire Substrates Prepared by Wet Chemical Etching Using Silica Masks-Reference-Cited by-同舟云学术

Enhanced Transmission and Self-Cleaning of Patterned Sapphire Substrates Prepared by Wet Chemical Etching Using Silica Masks

Author:

Wang Gui-Gen¹²^ORCID,Lin Zhao-Qing¹,Zhao Dong-Dong¹,Han Jie-Cai¹³

Affiliation:

1. Shenzhen Key Laboratory for Advanced Materials, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen 518055, P. R. China

2. Centre for Programmable Materials, School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798, Singapore

3. Center for Composite Materials, Harbin Institute of Technology, Harbin 150080, P. R. China

Funder

China Scholarship Council

National Natural Science Foundation of China

Natural Science Foundation of Guangdong Province

Shenzhen Municipality

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

Reference25 articles.

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