Low-Temperature Molecular Layer Deposition Using Monofunctional Aromatic Precursors and Ozone-Based Ring-Opening Reactions-Reference-Cited by-同舟云学术

Low-Temperature Molecular Layer Deposition Using Monofunctional Aromatic Precursors and Ozone-Based Ring-Opening Reactions

Published:2017-09-07 Issue:38 Volume:33 Page:9657-9665
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Svärd Laura¹^ORCID,Putkonen Matti¹,Kenttä Eija¹,Sajavaara Timo²,Krahl Fabian³,Karppinen Maarit³,Van de Kerckhove Kevin⁴,Detavernier Christophe⁴,Simell Pekka¹

Affiliation:

1. VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044 VTT, Espoo, Finland

2. Department of Physics, University of Jyväskylä, P.O. Box 35, FI-40014, Jyvaskyla, Finland

3. Department of Chemistry, School of Chemical Technology, Aalto University, P.O. Box 16100 FI-00076 Espoo, Finland

4. Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, Gent B-9000, Belgium

Funder

Suomen Akatemia

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b02456

Reference35 articles.

1. Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

2. Polymer films formed with monolayer growth steps by molecular layer deposition

3. Atomic layer deposited aluminum oxide barrier coatings for packaging materials

4. Hybrid Organic-Inorganic Films Grown Using Molecular Layer Deposition

5. Hybrid nanomaterials through molecular and atomic layer deposition: Top down, bottom up, and in-between approaches to new materials

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