New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles-Reference-Cited by-同舟云学术

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New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles

Published:2023-04-08 Issue:15 Volume:39 Page:5527-5541
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Brugnoli Luca¹^ORCID,Miyatani Katsuaki²,Akaji Masatoshi³^ORCID,Urata Shingo²^ORCID,Pedone Alfonso¹^ORCID

Affiliation:

1. Department of Chemical and Geological Sciences, University of Modena and Reggio Emilia, via G. Campi 103, 41125 Modena, Italia

2. Innovative Technology Laboratories, AGC Inc., Yokohama, Kanagawa 230-0045, Japan

3. Electronics Company, AGC Inc., Yokohama, Kanagawa 230-0045, Japan

Funder

AGC Inc.

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.3c00304

Reference55 articles.

1. Investigation on nanoscale material removal process of BK7 and fused silica glass during chemical‐mechanical polishing

2. Chemical Mechanical Polishing of Glass Disk Substrates: Preliminary Experimental Investigation

3. PERFORMANCE CHARACTERIZATION OF CERIUM OXIDE ABRASIVES FOR CHEMICAL-MECHANICAL POLISHING OF GLASS

4. Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

5. Chemical-Mechanical Polishing of Optical Glasses

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: Combining experiments and theoretical calculation;Tribology International;2024-11

2. Enhancing dispersion stability and recyclability of ceria slurry with polyacrylic acid for improved glass polishing performance;Journal of Industrial and Engineering Chemistry;2024-10

3. Systematic root cause analysis of ceria-induced defects during chemical mechanical planarization and cleaning;Journal of Manufacturing Processes;2024-10

4. Development of Ce/Cu co-doped dendritic mesoporous silica nanoparticles (DMSNs) as novel abrasive systems toward high-performance chemical mechanical polishing;Ceramics International;2024-09

5. A review on the development of ceria for chemical mechanical polishing;Powder Technology;2024-08

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