Kinetics formulation for Two-Dimensional Growth Behavior of Water/Ice Interface on Si Substrate-Reference-Cited by-同舟云学术

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Kinetics formulation for Two-Dimensional Growth Behavior of Water/Ice Interface on Si Substrate

Published:2024-02-15 Issue:8 Volume:40 Page:4033-4043
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Hanawa Yosuke¹^ORCID,Zhang Jianliang²,Sasmito Agus P.³^ORCID,Xu Minghan³,Akhtar Saad⁴,Mohit Mohammaderfan³,Yoshida Junichi¹,Sawada Koichi¹,Sasaki Yuta¹^ORCID,Sakuma Atsushi²

Affiliation:

1. SCREEN Holdings Co., Ltd., Kyoto 615-8194, Japan

2. Faculty of Fiber Science and Engineering, Kyoto Institute of Technology, Kyoto 606-8585, Japan

3. Department of Mining and Materials Engineering, McGill University, Montreal, QC H3A 0E8, Canada

4. GERAD and Department of Mathematics and Industrial Engineering, Polytechnique Montreal, Montreal, QC H3T 1N8, Canada

Funder

SCREEN Holdings Co., Ltd.

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.3c02594

Reference36 articles.

1. Understanding Pattern Collapse in Photolithography Process Due to Capillary Forces

2. Freeze Drying of High Aspect Ratio Structures

3. Preventing the Capillary-Induced Collapse of Vertical Nanostructures

4. (Invited) Supercritical Drying: A Sustainable Solution to Pattern Collapse of High-Aspect-Ratio and Low-Mechanical-Strength Device Structures

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