Atomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts
Author:
Affiliation:
1. Department of Chemistry, Faculty of Science, Anadolu University, 26470 Eskişehir, Turkey
2. Department of Chemistry, Faculty of Science, King Abdulaziz University, Jeddah, Saudi Arabia
Funder
Basic Energy Sciences
U.S. Department of Defense
Türkiye Bilimsel ve Teknolojik Arastirma Kurumu
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b02699
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