Perfectly Ordered Patterns Formed by a Heterogeneous Nucleation Process of Block Copolymer Self-Assembly Under Rectangular Confinement-Reference-Cited by-同舟云学术

Perfectly Ordered Patterns Formed by a Heterogeneous Nucleation Process of Block Copolymer Self-Assembly Under Rectangular Confinement

Published:2016-12-13 Issue:51 Volume:32 Page:13787-13794
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Yang Tao¹²,Tian Siwen¹,Zhu Yu¹,Li Weihua²^ORCID

Affiliation:

1. Ningxia Key Laboratory of Information Sensing & Intelligent Desert, School of Physics and Electronic-Electrical Engineering, Ningxia University, Yinchuan 750021, China

2. State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200433, China

Funder

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b03638

Reference54 articles.

1. Enabling nanotechnology with self assembled block copolymer patterns

2. Ordering in thin films of block copolymers: Fundamentals to potential applications

3. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

4. Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics

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