Phase Separation of Silicon-Containing Polymer/Polystyrene Blends in Spin-Coated Films
Author:
Affiliation:
1. Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China
2. Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China
Funder
Ministry of Science and Technology of the People's Republic of China
National Natural Science Foundation of China
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b00447
Reference50 articles.
1. Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers
2. Surface-induced structure formation of polymer blends on patterned substrates
3. Film Thickness Dependence of the Surface Structure of Immiscible Polystyrene/Poly(methyl methacrylate) Blends
4. Structure Formation via Polymer Demixing in Spin-Cast Films
5. Morphology of Immiscible Polymer Blend Thin Films Prepared by Spin-Coating
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