Kinetics, Chemistry, and Morphology of Syngas Photoinitiated Chemical Vapor Deposition
Author:
Affiliation:
1. CREPEC, Department of Chemical Engineering, École Polytechnique de Montréal, P.O. Box 6079, Station Centre-Ville, Montreal, Quebec H3C 3A7, Canada
Funder
Hydro-Qu?bec
Canada Foundation for Innovation
Fonds de Recherche du Qu?bec - Nature et Technologies
Canada Research Chairs
Natural Sciences and Engineering Research Council of Canada
?cole Polytechnique de Montr?al
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b04151
Reference66 articles.
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2. Vossen, J. L.; Kern, W.Thin Film Processes II;Academic Press:Boston, 1991; Vol.2, pp443–500.
3. Herner, S. B.InHandbook of Thin Film Deposition,3rd ed.Macleod, A.; Petti, C. J.; Hilali, M. M.; Prabhu, G., Eds.William Andrew Publishing:Oxford, U.K., 2012; pp361–381.
4. Macleod, A.InHandbook of Thin Film Deposition,3rd ed.Krishna, S., Ed.William Andrew Publishing:Oxford, U.K., 2012; Chapter 9, pp271–311.
5. Petti, C. J.; Hilali, M. M.; Prabhu, G.InHandbook of Thin Film Deposition,3rd ed.Krishna, S., Ed.William Andrew Publishing:Oxford, U.K., 2012; Chapter 10, pp313–359.
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