Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces-Reference-Cited by-同舟云学术

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Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces

Published:2016-06-01 Issue:23 Volume:32 Page:5890-5898
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Jin Cong¹²,Olsen Brian C.¹²,Wu Nathanael L. Y.²³,Luber Erik J.¹²,Buriak Jillian M.¹²

Affiliation:

1. Department of Chemistry, University of Alberta, 11227 Saskatchewan Drive, Edmonton, AB T6G 2G2, Canada

2. National Institute for Nanotechnology, National Research Council Canada, 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada

3. Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2G8, Canada

Funder

Canada Research Chairs

Natural Sciences and Engineering Research Council of Canada

Alberta Innovates - Technology Futures

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b01365

Reference47 articles.

1. Directing the self-assembly of block copolymers

2. Advances in square arrays through self-assembly and directed self-assembly of block copolymers

3. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

4. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

5. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

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1. Trilayered Block Copolymer Nanostructures Formed by an Iterative Layering Strategy;Advanced Materials Interfaces;2023-03-28

2. Effect of Disparity in Self Dispersion Interactions on Phase Behaviors of Molten A-b-B Diblock Copolymers;Polymers;2022-12-21

3. Competitive Registration Fields for The Development of Complex Block Copolymer Structures by A Layer‐by‐Layer Approach;Small;2022-12-11

4. van der Waals Epitaxy of Soft Twisted Bilayers: Lattice Relaxation and Mass Density Waves;ACS Nano;2020-09-15

5. Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes;Advanced Materials Interfaces;2019-12-29

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