Self-Assembly of Oligosaccharide-b-PMMA Block Copolymer Systems: Glyco-Nanoparticles and Their Degradation under UV Exposure

Author:

Zepon Karine M.123,Otsuka Issei12,Bouilhac Cécile4,Muniz Edvani C.5,Soldi Valdir3,Borsali Redouane12

Affiliation:

1. University Grenoble Alpes, CERMAV, F-38000 Grenoble, France

2. CNRS, CERMAV, F-38000 Grenoble, France

3. Departamento de Química, Universidade Federal de Santa Catarina, CEP - 88040-900, Florianópolis, Santa Catarina, Brazil

4. Institut Charles Gerhardt Montpellier UMR5253 CNRS-UM-ENSCM, Equipe Ingénierie et Architectures Macromoléculaires, Université Montpellier, Bâtiment 17−cc1702, Place Eugène Bataillon, 34095 Montpellier Cedex 5, France

5. Grupo de Materiais Poliméricos e Compósitos, GMPC—Departamento de Química, Universidade Estadual de Maringá, CEP 87020-900, Maringá, Paraná, Brazil

Funder

Agence Nationale de la Recherche

European Commission

Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico

Centre National de la Recherche Scientifique

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

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