Effect of Ablation Rate on the Microstructure and Electrochromic Properties of Pulsed-Laser-Deposited Molybdenum Oxide Thin Films
Author:
Affiliation:
1. CSIR-Central Electrochemical Research Institute, Karaikudi- 630 003, India
2. Academy of Scientific and Innovative Research (AcSIR), Central Electrochemical Research Institute, Karaikudi 630 003, India
Funder
University Grants Commission
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b02940
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