TiO<sub>2</sub>–SiO<sub>2</sub> Self-Standing Materials bearing Hierarchical Porosity: MUB-200(x) Series toward 3D-Efficient VOC Photoabatement Properties-Reference-Cited by-同舟云学术

TiO₂–SiO₂ Self-Standing Materials bearing Hierarchical Porosity: MUB-200(x) Series toward 3D-Efficient VOC Photoabatement Properties

Published:2023-03-06 Issue:11 Volume:39 Page:3871-3882
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Layan Elodie¹,Gupta Juhi¹,Ly Isabelle¹,Nallet Frédéric¹,Bentaleb Ahmed¹,Laurichesse Eric¹,Vallée Renaud¹,Blin Jean-Luc²,Lebeau Bénédicte³,Louërat Frédéric¹,Le Bechec Mickael⁴,Moonen Peter⁵⁶,Toupance Thierry⁷,Pigot Thierry⁴,Backov Rénal¹

Affiliation:

1. Université de Bordeaux, CRPP-UMR CNRS 5031, 115 Avenue Albert Schweitzer, 33600 Pessac, France

2. Institut Jean Barriol, UMR CNRS 7053 L2CM, Université de Lorraine, Faculté des Sciences et Technologies, BP 70239, 54506 Vandoeuvre lès Nancy cedex, France

3. CNRS - Institut de Science des Matériaux de Mulhouse (IS2M), 15 rue Jean Starcky - BP 2488, 68057 Mulhouse cedex, France

4. Université de Pau et des Pays de l’Adour, E2S UPPA, CNRS, IMT Mines Ales, IPREM, 64000 Pau, France

5. Université de Pau et des Pays de l’Adour, E2S UPPA, CNRS, Total, LFCR, 64000 Pau, France

6. Université de Pau et des Pays de l’Adour, E2S UPPA, CNRS, DMEX, 64000 Pau, France

7. Université de Bordeaux, Institut des Sciences Moléculaires CNRS UMR 5255, Bât. A12, 351 Cours de la Libération, 33405 Talence cedex, France

Funder

Universit? de Bordeaux

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c03062

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