Chemical Reactivity of Strongly Interacting, Hydrogen-Bond-Forming Molecules Following 193 nm Photon Irradiation: Methanol in Amorphous Solid Water at Low Temperatures-Reference-Cited by-同舟云学术

Chemical Reactivity of Strongly Interacting, Hydrogen-Bond-Forming Molecules Following 193 nm Photon Irradiation: Methanol in Amorphous Solid Water at Low Temperatures

Published:2023-02-10 Issue:7 Volume:39 Page:2838-2849
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Akerman Michelle Sykes¹^ORCID,Iny Hiley¹,Sagi Roey¹^ORCID,Asscher Micha¹^ORCID

Affiliation:

1. Institute of Chemistry, Edmund J. Safra Campus, Givat Ram, The Hebrew University of Jerusalem, Jerusalem 91904, Israel

Funder

Israel Science Foundation

Einstein Stiftung Berlin

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c03441

Reference71 articles.

1. Water as Buffer Material for Gold Nanocluster Growth

2. Structure−Reactivity Correlations in Pd−Au Bimetallic Nanoclusters

3. Reactive-Layer-Assisted Deposition Mechanism and Characterization of Titanium Oxide Films

4. Reduced Oxide Sites and Surface Corrugation Affecting the Reactivity, Thermal Stability, and Selectivity of Supported Au–Pd Bimetallic Clusters on SiO2/Si(100)

5. Buffer Layer Assisted Chemistry over Amorphous Solid Water: Oxide Thin Film or Metallic Nanoparticles Formation

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