Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique-Reference-Cited by-同舟云学术

Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique

Published:2023-03-10 Issue:11 Volume:39 Page:3883-3894
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Nguyen Duc-Binh¹²^ORCID,Ha Vinh-Phuc³⁴^ORCID,Vuong Vinh-Dat³⁴^ORCID,Chien Yi-Hsin¹^ORCID,Le Thang Van³⁴,Chu Chen-Yeon²^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Feng Chia University, Taichung City, 40724, Taiwan

2. Institute of Green Products, Feng Chia University, Taichung City, 40724, Taiwan

3. Ho Chi Minh City University of Technology (HCMUT), 268 Ly Thuong Kiet Street, District 10, Ho Chi Minh City, 740500, Vietnam

4. Vietnam National University Ho Chi Minh City, Linh Trung Ward, Thu Duc District, Ho Chi Minh City, 740500, Vietnam

Funder

Ministry of Education

National Science and Technology Council of Taiwan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c03116

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