Facile and Reconfigurable Opaque Droplet-based Photomask for Photolithography-Reference-Cited by-同舟云学术

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Facile and Reconfigurable Opaque Droplet-based Photomask for Photolithography

Published:2024-09-04 Issue: Volume: Page:
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Zhang Cheng¹²,Abdulla Aynur¹²,Xu Jiasu¹²,Jiang Lai¹²,Ding Xianting¹²^ORCID

Affiliation:

1. Department of Anesthesiology and Surgical Intensive Care Unit, Xinhua Hospital, School of Medicine and School of Biomedical Engineering, Shanghai Jiao Tong University, Shanghai 200092, China

2. State Key Laboratory of Oncogenes and Related Genes, Institute for Personalized Medicine, School of Biomedical Engineering, Shanghai Jiao Tong University, Shanghai 200030, China

Funder

Shanghai Jiao Tong University

Shanghai Municipal Youth Science and Technology Star Project

National Key Research and Development Program of China

China Postdoctoral Science Foundation

Shanghai Municipal Education Commission

Shanghai Municipal Health Commission

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.4c02305

Reference24 articles.

1. Gray-scale photolithography using microfluidic photomasks

2. Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

3. Review on Micro- and Nanolithography Techniques and their Applications

4. A microfluidic device for both on-chip dialysis protein crystallization and in situ X-ray diffraction

5. Laser writing techniques for photomask fabrication using a femtosecond laser

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