Extreme Ultraviolet-Induced Surface Modification of Self-Assembled Monolayers of Furoxans

Author:

Hwang Han-Na1,Kim Jung Sook1,Heo Jung Moo1,Park Joon Won1,Hwang Kwang-Jin1,Hwang Chan-Cuk1

Affiliation:

1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang, Kyungbuk 790-784, Korea, Center for Integrated Molecular Systems, Department of Chemistry, Division of Molecular and Life Sciences, Pohang University of Science and Technology, Pohang, Gyungbuk 790-784, Korea, and Department of Chemical System Engineering, Jochiwon, Chungnam, 339-701, Korea

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. International Technology Roadmap for Semiconductors, 2007 Edition, Lithography.http://www.itrs.net/Links/2007ITRS/2007_Chapters/2007_Lithography.pdf.

2. Optical Lithography Goes to Extremes--And Beyond

3. Pushing the limits of lithography

4. New Approaches to Nanofabrication:  Molding, Printing, and Other Techniques

5. "Dip-Pen" Nanolithography

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