Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing-Reference-Cited by-同舟云学术

Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

Published:2006-11-15 Issue:49 Volume:128 Page:15560-15561
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Sharpe Ruben B. A.¹,Burdinski Dirk¹,Huskens Jurriaan¹,Zandvliet Harold J. W.¹,Reinhoudt David N.¹,Poelsema Bene¹

Affiliation:

1. MESA+ Institute for Nanotechnology, MESA+ Strategic Research Orientation “Nanofabrication”, Molecular Nanofabrication, and Solid State Physics, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands, and Philips Research, High Tech Campus Eindhoven 11, 5656 AE Eindhoven, The Netherlands

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja065291b

Reference16 articles.

1. Defect-Tolerant and Directional Wet-Etch Systems for Using Monolayers as Resists

2. Spectroscopic and theoretical description of the electronic structure of the S = 3/2 nitrosyl complex of non-heme iron enzymes

3. Positive Microcontact Printing

4. Tien, J.; Xia, Y.; Whitesides, G. M. InThin Films; Ulman, A., Ed.; Academic Press: New York, 1998; Vol. 24, pp 227−253.

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