Surface Wave Plasma Abatement of CHF3 and CF4 Containing Semiconductor Process Emissions
Author:
Publisher
American Chemical Society (ACS)
Subject
Environmental Chemistry,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/es9805472
Reference19 articles.
1. Lide, D. R., Ed.CRC Handbook of Chemistry and Physics,73rd ed.; CRC Press: London, UK, 1993; p 9-130-131.
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