Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition

Published:2016-09-15 Issue:38 Volume:8 Page:25024-25029
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Quesada-González Miguel¹²,Boscher Nicolas D.²,Carmalt Claire J.¹,Parkin Ivan P.¹

Affiliation:

1. Materials Chemistry Research Centre, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom

2. Department of Materials Research and Technology, Luxembourg Institute of Science and Technology, 5 Avenue des Hauts-Fourneaux, Esch-sur-Alzette L-4362, Luxembourg

Funder

Fonds National de la Recherche Luxembourg

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b09560

Reference29 articles.

1. Amorphous TiO 2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation

2. Inorganic thin-film combinatorial studies for rapidly optimising functional properties

3. Titanium dioxide and composite metal/metal oxide titania thin films on glass: A comparative study of photocatalytic activity

4. Titania and silver–titania composite films on glass—potent antimicrobial coatings

5. Photocatalytic Oxidation of Deposited Sulfur and Gaseous Sulfur Dioxide by TiO2 Films

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