Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization-Reference-Cited by-同舟云学术

Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization

Published:2016-08-17 Issue:34 Volume:8 Page:21974-21978
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Ubukata Takashi¹,Nakayama Megumi¹,Sonoda Taishi¹,Yokoyama Yasushi¹,Kihara Hideyuki²

Affiliation:

1. Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan

2. Research Institute for Sustainable Chemistry (ISCHEM), National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

Funder

Japan Society for the Promotion of Science

Foundation for Promotion of Material Scinece and Technology of Japan

TonenGeneral Group

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b07943

Reference30 articles.

1. Directed bending of a polymer film by light