Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)-Reference-Cited by-同舟云学术

Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)

Published:2016-07-07 Issue:28 Volume:8 Page:17805-17816
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Böke Frederik¹,Giner Ignacio²,Keller Adrian²,Grundmeier Guido²,Fischer Horst¹

Affiliation:

1. Department of Dental Materials and Biomaterials Research, RWTH Aachen University Hospital, Pauwelsstrasse 30, 52074 Aachen, Germany

2. Technical and Macromolecular Chemistry, University of Paderborn, Warburger Strasse 100, 33098 Paderborn, Germany

Funder

Bundesministerium für Bildung und Forschung

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b04421

Reference63 articles.

1. Immobilisation of linear and cyclic RGD-peptides on titanium surfaces and their impact on endothelial cell adhesion and proliferation

2. Immobilization of specific proteins to titanium surface using self-assembled monolayer technique

3. In vitro degradation behavior and cytocompatibility of biodegradable AZ31 alloy with PEO/HT composite coating

4. In vitro and in vivo biocompatibility and corrosion behaviour of a bioabsorbable magnesium alloy coated with octacalcium phosphate and hydroxyapatite

5. Characterizations of titanium implant surfaces. III

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