Oxidative Reactions of Silicon Atoms and Clusters at Ultralow Temperature in Helium Droplets-Reference-Cited by-同舟云学术

Oxidative Reactions of Silicon Atoms and Clusters at Ultralow Temperature in Helium Droplets

Published:2010-11-19 Issue:50 Volume:114 Page:13045-13049
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Krasnokutski Serge A.¹,Huisken Friedrich¹

Affiliation:

1. Laboratory Astrophysics Group of the Max Planck Institute for Astronomy at the Friedrich Schiller University Jena, Institute of Solid State Physics, Helmholtzweg 3, D-07743 Jena, Germany

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp110323n

Reference21 articles.

1. Interstellar SiO as a tracer of high-temperature chemistry

2. Reaction rate studies of atomic germanium (3P0,1) and silicon (3PJ) with various oxidizers

3. Silicon chemistry in interstellar clouds

4. The Si($^\mathsf3$PJ) + O$_\mathsf2$ reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences

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