Functional Plasmonic Nanocircuits with Low Insertion and Propagation Losses-Reference-Cited by-同舟云学术

Functional Plasmonic Nanocircuits with Low Insertion and Propagation Losses

Published:2013-08-23 Issue:9 Volume:13 Page:4539-4545
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Kriesch Arian¹²,Burgos Stanley P.²,Ploss Daniel¹,Pfeifer Hannes¹,Atwater Harry A.²,Peschel Ulf¹

Affiliation:

1. Institute of Optics, Information and Photonics, Erlangen Graduate School in Advanced Optical Technologies, Friedrich-Alexander-University Erlangen-Nuremberg (FAU) and Max Planck Institute for the Science of Light, 91058 Erlangen, Germany

2. Kavli Nanoscience Institute, California Institute of Technology, Pasadena, California 91125, United States

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl402580c

Reference29 articles.

1. Circuits with Light at Nanoscales: Optical Nanocircuits Inspired by Metamaterials

2. Device Requirements for Optical Interconnects to Silicon Chips

3. Plasmonics: the next chip-scale technology

4. Plasmonics beyond the diffraction limit

5. Efficient Directional Coupling between Silicon and Copper Plasmonic Nanoslot Waveguides: toward Metal−Oxide−Silicon Nanophotonics

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