Crystal Structure of TaCl(NMe2)4 and Its Reactions with Lithium Amides and Water. Indirect Observation of an Equilibrium among TaCl(NMe2)4, Ta(NMe2)5 and Ta2(μ-Cl)2(NMe2)6Cl2-Reference-Cited by-同舟云学术

Crystal Structure of TaCl(NMe2)4 and Its Reactions with Lithium Amides and Water. Indirect Observation of an Equilibrium among TaCl(NMe2)4, Ta(NMe2)5 and Ta2(μ-Cl)2(NMe2)6Cl2

Published:2008-11-20 Issue:1 Volume:28 Page:167-171
ISSN:0276-7333
Container-title:Organometallics
language:en
Short-container-title:Organometallics

Author:

Chen Shu-Jian¹,Cai Hu¹,Xue Zi-Ling¹

Affiliation:

1. Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996−1600, and Department of Chemistry, Nanchang University, Nanchang 336000, China

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/om800362t

Reference25 articles.

1. High-κ Dielectric Materials for Microelectronics

2. Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide

3. Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

4. Chemical vapor deposition of ultrathin Ta2O5 films using Ta[N(CH3)2]5

5. Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry

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