Formation of Intramolecular Poly(4-hydroxystyrene) Dimer Radical Cation
Author:
Affiliation:
1. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp801949s
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1. Chemical Amplification Resists for Microlithography
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