Direct Patterning of Covalent Organic Monolayers on Silicon Using Nanoimprint Lithography-Reference-Cited by-同舟云学术

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Direct Patterning of Covalent Organic Monolayers on Silicon Using Nanoimprint Lithography

Published:2010-08-10 Issue:17 Volume:26 Page:14210-14215
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Voorthuijzen W. Pim¹²,Yilmaz M. Deniz¹,Gomez-Casado Alberto¹,Jonkheijm Pascal¹,van der Wiel Wilfred G.²,Huskens Jurriaan¹

Affiliation:

1. Molecular Nanofabrication group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

2. NanoElectronics Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la101445n

Reference38 articles.

1. Patterned Self-Assembled Monolayers and Meso-Scale Phenomena

2. Nanometer-scale patterning of self-assembled monolayer films on native silicon oxide

3. Formation and Structure of Self-Assembled Monolayers

4. Structure and growth of self-assembling monolayers

5. Reactive self-assembled monolayers on flat and nanoparticle surfaces, and their application in soft and scanning probe lithographic nanofabrication technologies

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