Layered Double Hydroxides as Highly Efficient Photocatalysts for Visible Light Oxygen Generation from Water
Author:
Affiliation:
1. Instituto de Tecnología Química, UPV-CSIC, Universidad Politécnica de Valencia, Avda. de Los Naranjos s/n, 46022 Valencia, Spain
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja905467v
Reference30 articles.
1. Photocatalysis for new energy production
2. A review and recent developments in photocatalytic water-splitting using TiO2 for hydrogen production
3. Solar-hydrogen: Environmentally safe fuel for the future
4. Photovoltaic hydrogen generation
5. Recent progress in the development of visible light-driven powdered photocatalysts for water splitting
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